With one of the smallest benchtop footprints, the Vac Techniche DST1-170 provides DC sputtering for high-resolution SEM and TEM sample preparation.
Providing high-resolution definition coatings with repeatable results due to the Auto process control, allowing easy set and operation.
The high vacuum Sputter Coater (DST1-170) can also be used for general metal sputtering for optics and thin-film coatings.
Sample rotation is standard, with tilt and height adjustment for most applications.
Vac Techniche also has a range of larger Turbo pumped sputter coaters with options of 1 to 3, 2″ magnetrons, RF and DC, sample heating, this range is the DST1-300 range.
high vacuum Sputter Coater (DST1-170), Turbo – Pumped Desk Sputter Coater: The magnetron desk sputter coater model DST1 is a compact coating system with the ability to coat semiconductors, dielectrics, and metals (oxidizing and non-oxidizing). Uniform thin films with fine-grain sizes are formed in a fast cycle time.
The DST1 is equipped with a magnetron cathode with the diameter of the cathode that could be 2-4 inches depending on the requirement.
Larger chamber sputter systems in DST range:DST1-300
DST1 – 2: The DST1-2 is configured as a sputter coater and fibre carbon coater (optional) with interchangeable heads in one instrument suitable for Scanning Electron Microscope (SEM) sample preparation.
This high vacuum coater offers high quality uniform films with fine grain sizes which are suitable for specimens that require high resolution and high quality characterization such as FE-SEM, EDS/WDS, TEM, and EBSD.
The DST1-2 with a 2” magnetron cathode, 300 W RF power supply (optional) with matching box, 80 W switching DC power supply and high current power supply for carbon evaporation (optional), could be used for research and different thin film applications
DST1 – 4: The large chamber DST1-4 with a 4” magnetron cathode, water-cooled, is ideally suitable for coating large specimens with diameters of up to 15 cm, or multiple smaller specimens over a similar diameter. The unlimited sputtering time makes it suitable for deposition of thick layer. The system is equipped with 800 W DC power supplies, 300 W RF power supply (optional) with matching box. The system can deposit wide ranges of materials on different surfaces for thin film applications such as Micro & Nano electronic and SEM sample preparation