RF Cleaning and Sample Preparation

Introducing a compact Desktop sample plasma cleaning unit form Bdiscom.

Bdiscom are known for their activity in the RF power generation, proving Sputtering RF generators and matching units, DC power supplies for Glow Discharge, Ion gun supply generators, and now, using their combined years of experience, they are successfully manufacturing desktop plasma cleaning Matrix systems that can easily be controlled and used without previous experience in this field.

Available in two sizes


The Bdiscom plasma reactor includes all the required functions to allow the process to be stable and repeatable, which provides a sound reason to include this into research and industrial applications.

The robust design makes this device for the industrial process of Photo-resist Ashing, Sample preperation, Oxide removal and many more.

A key advantage of this system is the design of the internal sub assemblies being manufactured inhouse to fir the applciuation of the end user, Bdiscom offer a design alterteration service to ensure that the final product is best suited for the intended application.

This approach has proven over the years to be a unique forward thinking method of working with each end user, Bdiscom will take the time to understand the application, and provide a system to match.

The system comprised of a vacuum chamber, inhouse designed and manufactured RF generators and variable inductor tuner integrated in the chamber

Plasma Matrix Application

  • Plasma Activation
  • Plasma Etching
  • Low temperature Plasma Ashing
  • SEM and TEM sample preparation
  • Fine cleaning if precision parts(mechanical)
  • Textile Surface treatments
  • Microfluidics component treatments
  • Ophthalmic (contact lens wetting)
  • Plastic treatment before printing or painting
  • Sterilization of medical equipment
  • Sterilization of medical consumables
  • Dental Implant cleaning treatment

Thin film

  • PECVD process
  • Gas precursors, HDMSO in vapour phase for quartz thin film deposition

Technical Specifications

  • Stainless steel process chamber (desktop L120mm x D=220mm)
  • 87mm electrode to sample holder
  • sample holder 110mm x 210mm
  • Front sample door with handle
  • Integrated 10W to 200W RF generator
  • Variable matching network

Gas Flow regulation

  • Needle valve
  • mass flow controllers
  • Vacuum gauge included
  • Single phase 95 – 250Vac, 50 or 60 Hz
  • Microprocessor control
  • Touch Screen display

Gas compatibility

  • Air
  • Oxygen
  • Nitrogen
  • Argon
  • Forming Gas
  • NO2
  • In general all non corrosive gases
  • CE Conformity